Atomic layer deposition

Atomic layer deposition (ALD) is a thin film deposition technique that is based on the sequential use of a gas phase chemical process. ALD is considered a subclass of chemical vapour deposition. The majority of ALD reactions use two chemicals, typically called precursors. These precursors react with the surface of a material one at a time in a sequential, self-limiting, manner. Through the repeated exposure to separate precursors, a thin film is slowly deposited. ALD is a key process in the fabrication of semiconductor devices, and part of the set of tools available for the synthesis of nanomaterials.

  • Functional films and efficient coating processes

    Optical system for inline monitoring of the film thickness and degree of crosslinking  of organic coatings © Photo Fraunhofer IVV

    The Fraunhofer Institute for Process Engineering and Packaging IVV together with the Fraunhofer Institute for Applied Polymer Research IAP and the Fraunhofer Institute for Interfacial Engineering and Biotechnology IGB will present new developments in films and the efficient control of coating processes at the upcoming International Converting Exhibition Europe ICE being held in Munich from 21 - 23 March 2017. Under the motto "Functional films – efficient coating processes", emphasis will be put on new film functionalities and accelerated test methods (Hall A5, Stand 1031).

  • Two-dimensional wonder material could make computers even faster

    Graphene is an atomic-scale honeycomb lattice made of carbon atoms.

    From generation to generation, high technology products are getting faster and more powerful. Again and again, new materials with new properties are needed to allow for continuous technological progress. On the search for promising future materials, scientists of Wilhelm-Ostwald-Institute of Physical and Theoretical Chemistry at Leipzig University and Jacobs University Bremen were the first ones to investigate the properties of a promising new so-called two-dimensional material, germanium phosphide. Thanks to their research, it could become possible to make computer processors even smaller and faster to make solar cells more efficient.