Physical vapor deposition

Physical vapor deposition (PVD) describes a variety of vacuum deposition methods which can be used to produce thin films. PVD uses physical process (such as heating or sputtering) to produce a vapor of material, which is then deposited on the object which requires coating.

  • Single crystal growth in hot air: nice and easy

    Schematic of the growth setup. The desired single crystals grow from separated educts at 1020°C via vapor transport. The condensation takes place at spikes placed in between the starting materials. © University of Augsburg/EP VI

    Physicists from Augsburg University together with colleagues from Oxford report on a novel method for the growth of lithium-based transition metal oxides. Augsburg/PhG/KPP -The synthesis of ceramic crystals often requires very complicated methods. Starting materials in form of powders have to be mixed, pressed and pre-reacted in order to allow for single crystal growth from the melt at elevated temperatures. Or samples are grown from solution or chemical vapor transport in complex processes. However, so far none of the established methods yields single crystals of lithium iridate - despite the great interest in this material that was initiated by the prediction of highly unusual magnetic properties.