Ultraviolet lithography

Ultraviolet lithography (also known as EUV or EUVL) is a next-generation lithography technology using an extreme ultraviolet (EUV) wavelength, currently expected to be 13.5 nm. EUV is currently being developed for possible future high volume use in 2020 for Intel's, Globalfoundries' and Samsung's 7 nm node, TSMC's 5 nm node, and SMIC's 14 nm node.

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